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Bias-assisted in vitro calcification of calcium disilicide growth layers on spark-processed silicon

Paper ID Volume ID Publish Year Pages File Format Full-Text
11488 744 2006 12 PDF Available
Title
Bias-assisted in vitro calcification of calcium disilicide growth layers on spark-processed silicon
Abstract

A dry-etch spark ablation method was used to produce calcium disilicide (CaSi2/Si) layers on silicon (Si) surfaces for the electrochemical growth of apatitic phosphates (calcium phosphate, CaP). CaSi2/Si composite electrodes readily calcify in vitro under the application of a small electric potential, and with proper treatment, the electrodeposition of CaP is localized to the sparked areas. In addition to increasing the local concentration of calcium, interfacial layers of CaSi2 on Si exhibit exceptional site selectivity towards CaP formation under bias due to the difference in conductivity between Si and CaSi2. The proposed mechanism for bias-assisted biomineralization of CaSi2/Si layers on spark-processed Si accounts for the physicochemical properties of deposited CaP films. This work also describes routes to surface modification of calcified composite electrodes with medicinally relevant compounds such as alendronate and norfloxacin. To assess the suitability of this material as a drug-delivery platform, release of the latter compound was also monitored as a function of time.

Keywords
Calcium disilicide; Spark ablation; Bioelectronics; Calcification; Drug delivery
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Bias-assisted in vitro calcification of calcium disilicide growth layers on spark-processed silicon
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Publisher
Database: Elsevier - ScienceDirect
Journal: Biomaterials - Volume 27, Issue 20, July 2006, Pages 3726–3737
Authors
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Subjects
Physical Sciences and Engineering Chemical Engineering Bioengineering
Get Full-Text Now
Don't Miss Today's Special Offer
Price was $35.95
You save - $31
Price after discount Only $4.95
100% Money Back Guarantee
Full-text PDF Download
Online Support
Any Questions? feel free to contact us