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Lithography application of a novel photoresist for patterning of cells

Paper ID Volume ID Publish Year Pages File Format Full-Text
13126 832 2004 9 PDF Available
Title
Lithography application of a novel photoresist for patterning of cells
Abstract

Photolithography is the current workhorse for the microelectronic industry. It has been used extensively for the creation of patterns on two-dimensional surfaces. Various research groups have studied the use of photolithography to pattern surfaces for the alignment of cells. So far, these applications have been limited due to the use of organic solvents in the pattern developing process, which can denature biomacromolecules that would be attached to the material. To address this problem, a novel bioactive photoresist (bioresist) based on the copolymer of methyl methacrylate and 3-(t-butoxycarbonyl)-N-vinyl-2-pyrrolidone (MMA:TBNVP) was prepared and in vitro fibroblast cell growth on this resist was studied. Results demonstrated that the resist is non-adhesive to the fibroblast cells. By deprotecting the t-BOC groups into carboxyl groups (MMA:D-TBNVP), the material became cell adhesive. Furthermore, cells were able to proliferate on the MMA:D-TBNVP surface. By culturing cells on the MMA:D-TBNVP surface in serum versus serum-free medium, we reached the conclusion that the chemistry of the deprotected copolymer indirectly promoted cell attachment through its absorbance of serum proteins on the material. Patterns of 25 μm×25 μm lines were obtained by chemically manipulating the surface of the photoresist using UV lithography without any solvent development. Fibroblast cells were observed to align on the patterned surface. This resist could be a suitable candidate to improve the application of conventional lithography in direct protein patterning for the guided growth of cells.

Keywords
Fibroblasts; Cell adhesion; Patterning; NVP; t-BOC; Chemically amplified photoresist
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Publisher
Database: Elsevier - ScienceDirect
Journal: Biomaterials - Volume 25, Issue 11, May 2004, Pages 2055–2063
Authors
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Subjects
Physical Sciences and Engineering Chemical Engineering Bioengineering
Get Full-Text Now
Don't Miss Today's Special Offer
Price was $35.95
You save - $31
Price after discount Only $4.95
100% Money Back Guarantee
Full-text PDF Download
Online Support
Any Questions? feel free to contact us