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High power impulse magnetron sputtering (HIPIMS) and traditional pulsed sputtering (DCMSP) Ag-surfaces leading to E. coli inactivation

Paper ID Volume ID Publish Year Pages File Format Full-Text
27191 44008 2012 7 PDF Available
Title
High power impulse magnetron sputtering (HIPIMS) and traditional pulsed sputtering (DCMSP) Ag-surfaces leading to E. coli inactivation
Abstract

This study addresses the high power impulse magnetron sputtering (HIPIMS) deposition of Ag-nanoparticle films on polyester and the comparison with films deposited by direct current pulsed magnetron sputtering (DCMSP). The first evidence is presented for the Escherichia coli bacterial inactivation by HIPIMS sputtered polyester compared to Ag–polyester sputtered by DCMSP. HIPIMS layers were significantly thinner than the DCMSP sputtered layers needing a much lower Ag-loading to inactivate E. coli within the same time scale. The Ag-nanoparticle films sputtered by DCMSP at 300 mA for 160 s was observed to inactivate completely E. coli within 2 h having a content of 0.205% Ag wt%/polyester wt%. HIPIMS-sputtered at 5 A for 75 s led to complete E. coli bacterial inactivation also within 2 h having a content Ag 0.031% Ag wt%/polyester wt%. The atomic rate of deposition with DCMSP is 6.2 × 1015 atoms Ag/cm2 s while with HPIMS this rate was 2.7 × 1015 atoms Ag/cm2 s. The degree of ionization of Ag+/Ag2+ and Ar+/Ar2+ was proportional to the target current applied during HIPIMS-sputtering as determined by mass spectroscopy. These experiments reveal significant differences at the higher end of the currents applied during HIPIMS sputtering as illustrated by the ion-flux composition. X-ray photoelectron spectroscopy (XPS) was used to determine the surface atomic concentration of O, Ag, and C on the Ag–polyester. These surface atomic concentrations were followed during the E. coli inactivation time providing the evidence for the E. coli oxidation on the Ag–polyester. X-ray diffraction shows Ag-metallic character for DCMSP sputtered samples for longer times compared to the Ag-clusters sputtered by HIPIMS leading to Ag-clusters aggregates. Ag-nanoparticle films on polyester sputtered by HIPIMS contain less Ag and are thinner compared to Ag-nanoparticle films sputtered by DCMSP.

Graphical abstractFigure optionsDownload full-size imageDownload as PowerPoint slideHighlights► HIPIMS Ag-nanoparticle films on polyester present a low content of Ag effective in E. coli inactivation. ► This leads to the material saving of non-renewable metals like Ag having environmental impact. ► The thickness of Ag-HIPIMS film was 5–6 times lower than the Ag-films sputteredwith DCMSP. ► HIPIMS sputtered Ag-nanoparticles provide higher fiber coverage compared to DCMSP.

Keywords
HIPIMS; DCMSP; Sputtering; Ag-nanoparticle films; E. coli; XPS
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High power impulse magnetron sputtering (HIPIMS) and traditional pulsed sputtering (DCMSP) Ag-surfaces leading to E. coli inactivation
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Publisher
Database: Elsevier - ScienceDirect
Journal: Journal of Photochemistry and Photobiology A: Chemistry - Volume 227, Issue 1, 1 January 2012, Pages 11–17
Authors
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Subjects
Physical Sciences and Engineering Chemical Engineering Bioengineering
Get Full-Text Now
Don't Miss Today's Special Offer
Price was $35.95
You save - $31
Price after discount Only $4.95
100% Money Back Guarantee
Full-text PDF Download
Online Support
Any Questions? feel free to contact us