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Effect of thickness of ALD grown TiO2 films on photoelectrocatalysis

Paper ID Volume ID Publish Year Pages File Format Full-Text
27450 44023 2009 9 PDF Available
Title
Effect of thickness of ALD grown TiO2 films on photoelectrocatalysis
Abstract

Atomic layer deposited TiO2 films were used for photoelectrocatalysis for the first time. Films with different thicknesses were grown and comprehensively characterized by structural and photoelectrochemical techniques. Methylene blue was used as a model substance in photocatalytic and photoelectrocatalytic degradation studies. In both cases, degradation rate was observed to saturate above certain film thickness. The reason for saturation could not be explained by the electrical parameters alone, and it was suggested that film morphology and crystalline structure are of major importance in this case.

Keywords
TiO2; ALD; Photoelectrocatalysis; PEC; Methylene blue
First Page Preview
Effect of thickness of ALD grown TiO2 films on photoelectrocatalysis
Publisher
Database: Elsevier - ScienceDirect
Journal: Journal of Photochemistry and Photobiology A: Chemistry - Volume 204, Issues 2–3, 20 May 2009, Pages 200–208
Authors
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Subjects
Physical Sciences and Engineering Chemical Engineering Bioengineering