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SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4

Paper ID Volume ID Publish Year Pages File Format Full-Text
27896 44049 2009 5 PDF Available
Title
SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
Abstract

The infrared multiphoton dissociation (IRMPD) of SiF4 in the presence of CH4 has been studied using a tunable CO2 TEA laser. The siliconated reaction products have been identified. A kinetic scheme has been proposed to explain the experimental results. The reaction rate constant of the trifluorosilyl radical, SiF3, with CH4 has been obtained from the numerical solution of the differential equation system associated to the kinetic mechanism proposed as well as from non-linear regression methods. It has been additionally found that this reaction occurs through two channels. The relative importance of each and their reaction rate constants have been determined as well.

Keywords
Silicon tetrafluoride; Trifluorosilyl; Infrared multiphoton dissociation; Reaction rate
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SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
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Publisher
Database: Elsevier - ScienceDirect
Journal: Journal of Photochemistry and Photobiology A: Chemistry - Volume 205, Issues 2–3, 25 June 2009, Pages 79–83
Authors
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Subjects
Physical Sciences and Engineering Chemical Engineering Bioengineering
Get Full-Text Now
Don't Miss Today's Special Offer
Price was $35.95
You save - $31
Price after discount Only $4.95
100% Money Back Guarantee
Full-text PDF Download
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Any Questions? feel free to contact us