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Novel polymeric nonionic photoacid generators and corresponding polymer Langmuir–Blodgett (LB) films for photopatterning

Paper ID Volume ID Publish Year Pages File Format Full-Text
28798 44093 2011 8 PDF Available
Title
Novel polymeric nonionic photoacid generators and corresponding polymer Langmuir–Blodgett (LB) films for photopatterning
Abstract

A series of new polymeric nonionic photoacid generators (PAGs) and PAG-bound polymers designed for photoresist materials in Langmuir–Blodgett (LB) films have been synthesized and characterized. The novel polymer could form a stable and condensed monolayer on water surface, which could be transferred successfully onto solid substrate. Upon deep UV irradiation, the acid generated by the photoacid generator catalyzed the naphthyl moiety to liberate naphthol and regenerate carboxyl in the exposed region. The rent moiety could dissolve in alkaline aqueous, resulting in a fine positive tone resist patterns with a resolution of 0.75 μm. Sensitivity curves and TGA studies revealed that the high sensitivity in 248 nm irradiation was attributed to the present of PAG units incorporated in the polymer chains. The result of translated gold pattern with the same resolution as the resist pattern also demonstrated that the resist LB films had sufficient resistance to wet etching process.

Keywords
Photoacid generator; Langmuir–Blodgett films; Polymer resist; Photolithography; Photodegradation
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Novel polymeric nonionic photoacid generators and corresponding polymer Langmuir–Blodgett (LB) films for photopatterning
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Publisher
Database: Elsevier - ScienceDirect
Journal: Journal of Photochemistry and Photobiology A: Chemistry - Volume 219, Issue 1, 5 March 2011, Pages 50–57
Authors
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Subjects
Physical Sciences and Engineering Chemical Engineering Bioengineering
Get Full-Text Now
Don't Miss Today's Special Offer
Price was $35.95
You save - $31
Price after discount Only $4.95
100% Money Back Guarantee
Full-text PDF Download
Online Support
Any Questions? feel free to contact us