fulltext.study @t Gmail

Atomic layer deposition of TiO2−xNx thin films for photocatalytic applications

Paper ID Volume ID Publish Year Pages File Format Full-Text
28841 44096 2006 8 PDF Available
Title
Atomic layer deposition of TiO2−xNx thin films for photocatalytic applications
Abstract

Titanium dioxide (TiO2) is recognized as the most efficient photocatalytic material, but due to its large band gap energy it can only be excited by UV irradiation. Doping TiO2 with nitrogen is a promising modification method for the utilization of visible light in photocatalysis. In this work, nitrogen-doped TiO2 films were grown by atomic layer deposition (ALD) using TiCl4, NH3 and water as precursors. All growth experiments were done at 500 °C. The films were characterized by XRD, XPS, SEM and UV–vis spectrometry. The influence of nitrogen doping on the photocatalytic activity of the films in the UV and visible light was evaluated by the degradation of a thin layer of stearic acid and by linear sweep voltammetry. Light-induced superhydrophilicity of the films was also studied. It was found that the films could be excited by visible light, but they also suffered from increased recombination.

Keywords
Photocatalysis; Titanium dioxide; Nitrogen doping; ALD; Thin films
First Page Preview
Atomic layer deposition of TiO2−xNx thin films for photocatalytic applications
Get Full-Text Now
Don't Miss Today's Special Offer
Price was $35.95
You save - $31
Price after discount Only $4.95
100% Money Back Guarantee
Full-text PDF Download
Online Support
Any Questions? feel free to contact us
Publisher
Database: Elsevier - ScienceDirect
Journal: Journal of Photochemistry and Photobiology A: Chemistry - Volume 177, Issue 1, 1 January 2006, Pages 68–75
Authors
, , , , ,
Subjects
Physical Sciences and Engineering Chemical Engineering Bioengineering
Get Full-Text Now
Don't Miss Today's Special Offer
Price was $35.95
You save - $31
Price after discount Only $4.95
100% Money Back Guarantee
Full-text PDF Download
Online Support
Any Questions? feel free to contact us