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Chemistry of photolithographic imaging materials based on the chemical amplification concept

Paper ID Volume ID Publish Year Pages File Format Full-Text
31354 44747 2007 17 PDF Available
Title
Chemistry of photolithographic imaging materials based on the chemical amplification concept
Abstract

This review describes the versatile chemistry of photolithographic imaging materials developed for nanofabrication of semiconductor devices. Conventional photoresists based on novolac/diazonaphthoquinone systems are not appropriate for the generation of relief images under sub-100 nm. In order to employ deep UV radiation techniques that are required for nanopattern generation, such as with 248, 193 and 157 nm excimer lasers, completely different strategies are required. Incorporation of chemical amplification concept into the design of resist systems has led to significant breakthroughs in the photolithography industry. In a chemically amplified resist system, a cascade of chemical events is promoted by photochemically generated initiating molecules. This leads to changes in the chemical or physical properties of the resist systems which typically develop during the postexposure baking procedure. Polarity change of the resist polymer along with depolymerization and crosslinking strategies has been widely employed in chemically amplified systems. Chemistry related to radiation resists using high-energy photons and charged particles, such as extreme-UV, X-ray, electron beam, ion beam has also been developed.

Keywords
Photolithography; Chemical amplification; Photoacid generator; Photoresist
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Chemistry of photolithographic imaging materials based on the chemical amplification concept
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Publisher
Database: Elsevier - ScienceDirect
Journal: Journal of Photochemistry and Photobiology C: Photochemistry Reviews - Volume 8, Issue 4, December 2007, Pages 157–173
Authors
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Subjects
Physical Sciences and Engineering Chemical Engineering Bioengineering
Get Full-Text Now
Don't Miss Today's Special Offer
Price was $35.95
You save - $31
Price after discount Only $4.95
100% Money Back Guarantee
Full-text PDF Download
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Any Questions? feel free to contact us