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Towards atomic level vanadium doping of TiO2 via liquid-phase atomic layer deposition

Paper ID Volume ID Publish Year Pages File Format Full-Text
41061 45876 2011 4 PDF Available
Title
Towards atomic level vanadium doping of TiO2 via liquid-phase atomic layer deposition
Abstract

Vanadium-doping of TiO2 at the atomic level was achieved via a liquid phase atomic layer deposition (L-ALD) method. UV–vis absorption edge of vanadium-doped TiO2 has been red-shifted ∼55 nm into visible light region. Photocatalytical assessment reveals that the degradation rate of methylene blue (MB) for vanadium-doped TiO2 under visible light illumination was enhanced by up to 500% compared to the undoped TiO2. This improvement was believed to be attributed to the atomic level doping of the L-ALD method.

Graphical abstractFigure optionsDownload full-size imageDownload high-quality image (233 K)Download as PowerPoint slideHighlights► A new, liquid-phase atomic layer deposition has enabled atomic level doping of TiO2. ► Vanadium doping of TiO2 via L-ALD results in redshift of band edge by up to 55 nm. ► Up to 500% increase of visible light photocatalytic activity is seen in the V-doped TiO2.

Keywords
Atomic force microscopy (AFM); Crystalline oxide; Atomic layer epitaxy
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Publisher
Database: Elsevier - ScienceDirect
Journal: Applied Catalysis A: General - Volumes 409–410, 15 December 2011, Pages 87–90
Authors
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Subjects
Physical Sciences and Engineering Chemical Engineering Catalysis
Get Full-Text Now
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Price was $35.95
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Price after discount Only $4.95
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Full-text PDF Download
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