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Effect of oxygen and nitrogen concentration of nitrogen doped TiOx film as photocatalyst prepared by reactive sputtering

Paper ID Volume ID Publish Year Pages File Format Full-Text
42402 45923 2009 12 PDF Available
Title
Effect of oxygen and nitrogen concentration of nitrogen doped TiOx film as photocatalyst prepared by reactive sputtering
Abstract

The N-doped TiOx films were prepared by radio-frequency (RF) magnetron reactive sputtering of Ti target in a mixed gas of Ar, O2 and N2. The effects of varying oxygen and nitrogen flow ratios on the physical properties and photocatalytic properties with defect formation energies using DFT calculations were investigated, and the photocatalytic ability was evaluated by decomposition of NO gas. The photocatalytic properties as well as other film properties such as lattice parameters, grain sizes, surface atomic contents, surface doping configurations, and optical properties strongly depend on the gas flow ratios. The N-doping configuration in TiO2 is significantly affected by the oxygen concentration in sputtering, based on the XPS and the defect formation energy results. Also, the visible light photocatalysis of N-doped TiOx film requires a certain range of oxygen and nitrogen concentrations in the sputtering process. The substitutional N-doped TiO2 has weak photocatalysis compared with the interstitial N (or NOx)-doped TiO2, suggesting that the interstitial N (NOx)-doping states with the oxygen deficiency are more effective for photocatalysis than the substitutional N-doping states with the oxygen deficiency, probably due to the variation in the number and location of the impurity levels (active recombination sites) in the energy band gap.

Graphical abstractThe N-doping configuration in TiO2 is significantly affected by the oxygen concentration in sputtering, and the visible light photocatalysis of N-doped TiOx film requires the permissible range of oxygen and nitrogen concentrations in sputtering. The best range of the oxygen and nitrogen ratio in sputtering for the N-doped TiOx film as photocatalyst could be found. The interstitial N (NOx) doping states with the oxygen deficiency are more effective for photocatalysis than the substitutional N-doping states with the oxygen deficiency.Figure optionsDownload full-size imageDownload high-quality image (147 K)Download as PowerPoint slide

Keywords
Photocatalyst; Nitrogen-doping; Oxygen deficiency; Titanium dioxide; Nitric oxidation decomposition
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Effect of oxygen and nitrogen concentration of nitrogen doped TiOx film as photocatalyst prepared by reactive sputtering
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Publisher
Database: Elsevier - ScienceDirect
Journal: Applied Catalysis A: General - Volume 371, Issues 1–2, 15 December 2009, Pages 179–190
Authors
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Subjects
Physical Sciences and Engineering Chemical Engineering Catalysis
Get Full-Text Now
Don't Miss Today's Special Offer
Price was $35.95
You save - $31
Price after discount Only $4.95
100% Money Back Guarantee
Full-text PDF Download
Online Support
Any Questions? feel free to contact us