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Chemically active plasmas for surface passivation of Si photovoltaics

Paper ID Volume ID Publish Year Pages File Format Full-Text
53871 46987 2015 10 PDF Available
Title
Chemically active plasmas for surface passivation of Si photovoltaics
Abstract

•We review the chemically active plasmas for surface passivation of Si PV.•We examine the plasma catalyzed deposition for passivation materials.•The involved physical and chemical elementary processes are given.•The passivation mechanism is pinpointed.•The relationship between plasma process and passivation performance is identified.

The plasma catalyzed deposition of compound dielectrics is very common for surface passivation of Si-based solar cells in recent decades. This paper reviews the underlying physics and chemistry of chemically active plasmas for the deposition of dielectric films including hydrogenated amorphous silicon nitride (a-SiNx:H), aluminum oxide (Al2O3) and hydrogenated amorphous silicon oxide (a-SiOx:H). The relevant growth and passivation mechanisms are identified and several examples are selected to represent the superiority of plasma processes in the application of Si photovoltaics.

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Keywords
Reactive plasma; Surface passivation; Si photovoltaics
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Chemically active plasmas for surface passivation of Si photovoltaics
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Publisher
Database: Elsevier - ScienceDirect
Journal: Catalysis Today - Volume 252, 1 September 2015, Pages 201–210
Authors
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Subjects
Physical Sciences and Engineering Chemical Engineering Catalysis
Get Full-Text Now
Don't Miss Today's Special Offer
Price was $35.95
You save - $31
Price after discount Only $4.95
100% Money Back Guarantee
Full-text PDF Download
Online Support
Any Questions? feel free to contact us