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Molecular dynamics simulations of supported metal nanocatalyst formation by plasma sputtering

Paper ID Volume ID Publish Year Pages File Format Full-Text
53939 46990 2015 10 PDF Available
Title
Molecular dynamics simulations of supported metal nanocatalyst formation by plasma sputtering
Abstract

•Review on MD simulations of nanocatalyst growth under magnetron sputter deposition.•MD allows a detailed understanding of catalyst growth under magnetron sputtering deposition.•Comparison with experiments of nanocatalyst composition, structure and morphology.•Future perspectives, including multimetallic catalysts and improved force fields.

Magnetron sputtering is a widely used physical vapor deposition technique for deposition and formation of nanocatalyst thin films and clusters. Nevertheless, so far only few studies investigated this formation process at the fundamental level. We here review atomic scale molecular dynamics simulations aimed at elucidating the nanocatalyst growth process through magnetron sputtering. We first introduce the basic magnetron sputtering background and machinery of molecular dynamics simulations, and then describe the studies conducted in this field so far. We also present a perspective view on how the field may be developed further.

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Keywords
Molecular dynamics; Supported nanocatalyst; Sputter deposition; Supported cluster growth
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Molecular dynamics simulations of supported metal nanocatalyst formation by plasma sputtering
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Publisher
Database: Elsevier - ScienceDirect
Journal: Catalysis Today - Volume 256, Part 1, 1 November 2015, Pages 3–12
Authors
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Subjects
Physical Sciences and Engineering Chemical Engineering Catalysis
Get Full-Text Now
Don't Miss Today's Special Offer
Price was $35.95
You save - $31
Price after discount Only $4.95
100% Money Back Guarantee
Full-text PDF Download
Online Support
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