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Intracellular chromosome breaks on silicon surface

Paper ID Volume ID Publish Year Pages File Format Full-Text
8812 607 2009 5 PDF Available
Title
Intracellular chromosome breaks on silicon surface
Abstract

The genotoxicity of silicon (Si) is investigated by soaking crystalline Si in a complete culture medium for 60 days and conducting micronuclei tests (MNTs) utilizing hamster ovary (CHO) cells and its Ku80 deficient CHO mutant (xrs5) cells (DNA double-strand breaks repair deficiency). The intracellular concentrations of reactive oxygen/nitrogen species (ROS/RNS) on Si are determined to elucidate the relationship between ROS/RNS and Si-induced genotoxicity by using CHO cells. The cells are treated with ROS scavenger (dimethyl sulfoxide) and MNT are performed. The results indicate that the intracellular concentration of ROS and nitrogen oxide (NO) on Si is higher than those on the control group by about 38% and 12%. ROS/RNS include superoxide (O2−) anion, NO, and peroxynitrite (ONOO−) which can injure chromosomes and induce high cellular DNA double-strand breaks (DSBs).

Keywords
Silicon; Reactive oxygen/nitrogen species; Micronuclei; DNA double-strand breaks; Biocompatibility
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Publisher
Database: Elsevier - ScienceDirect
Journal: Biomaterials - Volume 30, Issue 14, May 2009, Pages 2661–2665
Authors
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Subjects
Physical Sciences and Engineering Chemical Engineering Bioengineering
Get Full-Text Now
Don't Miss Today's Special Offer
Price was $35.95
You save - $31
Price after discount Only $4.95
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Full-text PDF Download
Online Support
Any Questions? feel free to contact us